Cathode materials are ejected toward the anode tube and the ion chemically and physically reacts with the cathode. Study of plasma and ion beam sputtering processes 129 of an ion source for a particular application should be made with due consideration of factors such as species and intensity capability, beam quality emittance and brightness, ionization efficiency, reliability,ease of operation, maintenance, and source lifetime. Jp3926206b2 ultrahigh vacuum exhaust device, vacuum. The pumping mechanisms for reactive and inert gas species, as well as argon. Always use high purity argon gas of the grade known as white spot this will ensure fast sputter rate and good pump down time. The sputtering is caused by a dc microplasma between two titanium thinfilm electrodes as shown in fig. The gst07l is a sputter ion pump controller which features sophisticated functions and highgrade reliability. Excellent introductions to vacuum systemchapter s in viscous and transitional regimes can be. Using the anode layer ion source from as an ion pump. Sputter ion pump models v20, v30, v60, v110, v140, v220, v270.
Agilent, decided to develop dedicated ion pump solutions including controllers and all. Pump the gaspurifying micromachined sputter ion pump microsip operates by sputtering titanium, bonding this titanium to gas molecules, and removing these molecules from the environment. Ion pump a vacuum pump in which the scavenged gas is subjected to intense ionization and the positively charged ions that form are removed by an electric field. Ion pump article about ion pump by the free dictionary. This pumping occurs in a manner similar to that by which the inert gases are pumped. Ion pumps create a vacuum of 10 4 newtons per sq m, or 10 6 mm of mercury. Hydrogen 150 to 200% methane 100% other lightweight hydrocarbons 80 to 120% oxygen 80% argon 30% helium 28% sputter ion pumps allow, based on the discharge current, the measurement of the pressure within the vacuum cham. Because hydrogen is a dominant gas at the ultimate of a metal system, it is necessary to combine either a sublimation or a getter pump with the sputterion pump in order to maintain efficient pumping. Application of compact negsputter ion pump combination in uhv system of hiaf. A voltage is applied between them so that the target is the cathode and the substrate is attached to the anode.
Theory of operation gamma vacuum, everything ion pump. These parameters are best determined by consulting the user manual for the sputterion pump andor the control unit. Connect the high voltage cable to an ion pump controller with. Various parameters, such as magnetic field, electrode voltage, operating pressure, pump history, electrode contamination and partial pressure of other gases are shown to have a major influence on the pumping speed for any given gas. They are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and. These features make the sputter ion pump the preferred one for the use in accelerators and analysis equipment. Distributed sputterion pumps for use in low magnetic fields article pdf available in ieee transactions on nuclear science 263. A detail treatment of the subject of capture pumps, including sips, is given else where. Valve off the roughing pump, and start the sputter ion pump. Recent work has suggested that free radicals escaping from ion pumps can influence the results of some. A sputter ion pump is a device for producing very high vacuum conditions. Modion ion vacuum pumps advanced ion pump technology. The general requirements are a source of electrons, a small region.
Performance is superior in comparison to diode pumps with differential cathodes and in comparison to conventional triode pumps. In all types of ion sources, the gas ions are produced by various types of gas discharge including electron collisions with gas atoms. Sputterion pump article about sputterion pump by the free. Sputter ion pump ion pump an ion pump is a type of vacuum pump capable of reaching pressures as low as 10. Entrapment or capture vacuum pumps, which retain gas molecules by chemical or physical interaction on their internal surfaces. The experimental results suggest that the geometrical. As with all gas capture pumps, the sputter ion pump requires no backing pump, and does have a limited lifetime, based on its. An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv. The following paper outlines the working principles of sputterion pumps. Excellent introductions to vacuum systemchapter s in viscous and transitional regimes can be found in refs. Sputterion pump article about sputterion pump by the.
The full speed of the pump is developed in the pressure range from about 106 to 108 torr, although the. Application of compact negsputter ion pump combination in uhv system of hiaf article pdf available in vacuum 157 august 2018 with 90 reads how we measure reads. Pdf application of compact negsputter ion pump combination in. The pumping effect is based chiefly on gettering processes. As a consequence, the application range for ion pumps became more clearly identified as uhv. This involves ejecting material from a target that is a source onto a substrate such as a silicon wafer.
Background sputterion pumps sips are capture pumps. Sputterion pumps may be single or multiple cell types, and can be of diode or triode design. Use the supplied cable or a cable with the appropriate mating connector for your feedthrough. The long term pumping of argon is very stable with this element. This pump has a simple design with no moving parts to produce wear and vibration. Together with the getter and the sputter ion pump, the cryopump is the most prominent representative of the latter group. Ion pumps typical operating cycle rough pump with clean technology turbo, trapped mechanical, sorption rough to pressure below 103 t0rr lower pressure saves time, extends life turn on ion pump control unit high voltage cycle power if necessary to avoid overheating valve off roughing pump walk away.
Ion pump an ion pump is a vacuum pump, where the pumped out gas is subjected to extensive ionization, and the positively charged ions that are. Under ideal conditions, ion pumps are capable of reaching pressures as low as 10. Ion pumps operation and applications duniway stockroom. So in sputtering, the target material and the substrate is placed in a vacuum chamber. Sputter ion pump is one of the pumps used to generate ultra and extremelyhigh vacuum. Scroll, which soon became the ideal complement to sips in the higher range of pressure. An ion pump is a type of vacuum pump which operates by sputtering a metal getter.
Pdf distributed sputterion pumps for use in low magnetic. Apr 29, 2017 using the anode layer ion source from as an ion pump. Pdf hiafbring, a new multipurpose accelerator facility of the high intensity heavyion accelerator facility project. That is, h2 is pumped in the walls of the anode cells by high energy neutral burial. It is the product of ulvacs extensive technological reserves and long track record of proven performance in the ultrahigh vacuum field. Miniature sputterion pump design considerations or. Sputter ion pumps are one type of pump used to create ultrahigh vacuum, and are used in many analyzers and accelerators. Record vessel pressure, and sputter ion pump power supply voltage and current as a. The neg pump, coupled to a distributed sputterion pump sip mostly intended to pump residual argon and possibly methane constitutes the principal pumping system for the uhv regime, allowing routine operation in the low 1011 torr range. Rotary planetary specimen stages are essential for ensuring even coatings on specimens with irregular surfaces. Sputter ion pumps may be single or multiple cell types, and can be of diode or triode design. Except for the ion sources plasma chambers, the vacuum systems of accelerators operate in free molecular regime. Evacuate the sputter ion pump and the vacuum vessel to a pressure of less than 20 microns 2 x102 torr.
Because hydrogen is a dominant gas at the ultimate of a metal system, it is necessary to combine either a sublimation or a getter pump with the sputter ion pump in order to maintain efficient pumping. View and download varian 9191115 instruction manual online. Sputter deposition is a physical vapor deposition pvd method of thin film deposition by sputtering. Jun 24, 2011 ion pump an ion pump is a vacuum pump, where the pumped out gas is subjected to extensive ionization, and the positively charged ions that are formed as a result are removed by an electric field. Also, above about 2x104 torr, the discharge changes modes to a less confined form as the mean free path for charged particles and molecules decreases. With the addition of agilent complete line of oilfree, low vibration. Ulvac has developed the acter series of sputter ion. Ion pumps sputter ion pumps, getter ion pumps, penning pumps provide a clean, simple, low maintenance alternative for producing and maintaining high and ultrahigh vacuum. The generic name sputter ion pump or ion getter pump comes from the fact that some of the gas molecules undergo ionization and cause sputtering of the sputtering agent. An ion pump ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which allows the ions to accelerate into and be. Ultrahigh vacuum exhaust device, vacuum exhaust method, and sputter ion pump download pdf info publication number jp3926206b2. An overview of sputterion pump weight versus pumping speed will.
Each sputterion pump requires a control unit of an appropriate voltage level, polarity and current capacity. For a list of companies that supplied major parts or important services for huygens gcms, click here. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to the anode a potential higher than that of the cathode. Modion is a compact, modular ion pump system with industrial, laboratory, and cuttingedge scientific applications. The positive ion is forced out of the anode tube by the high voltage field at a high velocity toward the cathode plate. Hydrogen pumping by sputterion pumps and getter pumps. Poly gate pmos mit opencourseware free online course. Occasionally, questions or problems about performance may arise and this.
For the purposes of this laboratory, we will describe the operation of a single cell diode type sputter ion vacuum pump. A sputter ion pump consists basically of two electrodes, anode and cathode, and a magnet fig. Pdf application of compact negsputter ion pump combination. A plasma is created by ionizing a sputtering gas generally a chemically inert, heavy gas like argon. Ion pump sputter ion pump modion ion vacuum pumps by j.
This is a picture of the sputter ion pump parts, not the assembled sputter ion pump. The pumping effect of sputter ion pumps is produced by sorption processes, which are released by ionised gas particles. At high operating voltages, leakage currents, especially field emission currents, interfere with using the ion pump current as an indicator of pressure. Pumping mechanisms in sputter ion pumps are quite different for different gasses, and as a consequences pumping speeds are different too. Ion pumps are shipped under vacuum to ensure ultra high vacuum cleanliness and to demonstrate the vacuum integrity of the ion pump. Learn the translation for sputter in leo s english. The exponential dependence of field emission leakage current versus operating. As with all gas capture pumps, the sputterion pump requires no backing pump, and does have a limited lifetime, based on its.
If the original documents are not available, the manufacturers catalog may have the information. Capacities are available up to 14,000 cu ft per minute, with an operating pressure range of 102 torr to below 1011 torr. This material chemically reacts with the active gases to form stable compounds that are. Optimization of sputter ion pumps one of the main issues in the use of sputter ion. Resputtering is reemission of the deposited material during the deposition process by ion or atom bombardment. Miniature sputterion pump design considerations duniway. The pumping speed is achieved by parallel connection of many individual penning cells. Study of plasma and ion beam sputtering processes 1 the conversion of neutral particles into ions, electrons plasma. Ulvacs acter pumps are designed for developing new elements acter elements with improved evacuation characteristics at ultrahigh and extremely high vacuum, and to optimize magnetic fields. For the purposes of this laboratory, we will describe the operation of a single cell diode type sputterion vacuum pump. A conventional sputter ion pump comprises a vacuum envelope housing, at least one cathode electrode, an anode electrode formed as a plurality of hollow cylindrical cells, and means for applying to. Varian vacuum, now agilent vacuum has always been at the forefront of vacuum technology, setting industry standards since 1957, with the invention of the ion pump that made uhv possible. Ulvacs acter pumps were developed to enable single sputter ion pumps to create ultrahigh vacuum on the order of 1010 pa. An ion pump also referred to as a sputter ion pump is a type of vacuum pump capable of reaching pressures as low as 10.
The pumping mechanisms for reactive and inert gas species, as well as argon instability. An ion pump also referred to as a sputter ion pump is a type of vacuum pump which operates by sputtering a metal getter. Other articles where sputter ion pump is discussed. A study has been performed to design a new sputter ion pump sip using adequate axisymmetric spindle magnetic field instead of dipole field, which reduces continuous loss of electrons plasma and confine them for longer time through magnetic mirror action. An ion pump first ionizes gas within the vessel it is attached to and employs a strong electrical potential, typically 37 kv, which accelerates the ions into a solid electrode. Silver as a removable coating for scanning electron. Ion pumpnoble pump is an ultrahigh vacuum pump which utilizes the gas adsorption properties of the cathode material sputtered by cold cathode discharge within a magnetic field and the continuous formation of active getter film by sputtering cathode material ti during collision with the cathode. Specifications of sputter ion pump power supplies s. Ideal vacuum agilent varian small vacion plus ion pump. Pumping mechanisms in sputterion pumps low pressure operation. The sputter ion pump combines mechanical, electrical, magnetic and chemical principles to permanently capture residual gas molecules in vacuum systems.
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